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- Advanced Energy Unveils NavXTM Impedance Matching Network
Advanced Energy Unveils NavXTM Impedance Matching Network

Key Highlights:
NavX™ features industry-leading algorithms and direct generator communication for superior plasma control.
Selectable tuning algorithm enables impedance matching to multiple RF pulse states, reducing reflected power.
Paired with eVerest™ generator, the system ensures precise control in complex semiconductor etch processes.
Source (Business Wire)
Notable Quote:
"Building on over 20 years of experience in developing advanced RF delivery systems for plasma processes, the NavX matching network redefines tuning speed, sophistication, and RF synchronization for exacting plasma control across the most complex pulsing profiles."
Our Take:
The unveiling of the NavX™ impedance matching network by Advanced Energy represents a significant advancement in semiconductor fabrication technology. The integration of industry-leading algorithms and direct generator communication highlights the company's commitment to precision and innovation. This new platform addresses critical challenges in next-generation semiconductor etch processes, ensuring superior control and efficiency. Advanced Energy's extensive experience and technological prowess are evident in the NavX's ability to handle rapid pulsing, frequent transitions, and longer recipes, which are essential for the production of smaller, faster, and more efficient chips with complex 3D structures.